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A New Generation of Laser Direct Imaging

Spherical Surface Lithography Solutions

ALDI-SD Series – turn your idea into reality!

ALDI-SD series is designed for versatile semiconductor lithography applications on non-planar surface. It is capable of producing photolithography in nearly any type of surface or substrate material. Compare to conventional mask exposure system, it has a special designed stage and control system to pattern the substrate on the non-planar surface. It uses a unique exposure procedure, utilizing highly efficient semiconductor light source and a high resolution spatial light modulator to generate a clean high definition image with refined line width without stitching error. In addition, with the line edge smoothing technology, ALDI-SD can get better profile and better resolution. It can image on silicon ball diameter from 1mm to 100mm or even bigger, with resolution down to 1um.
ALDI-SD provides solution for spherical surface lithography or any non-planar surface lithography.
  • Minimum feature size is 1um line and space.
  • Substrate size from 1mm diameter up to 100mm diameter, larger substrate size available upon request.
  • Line edge smoothing technology utilizing micro lens array to produce better line edge performance and resolution.
  • Excellent CD uniformity
  • Real time scaling and distortion compensation technology allowing dynamic adaption to scale and rotate the pattern in real time to compensate any variation cause by flatness variation for better registration performance.
Customization and Automation Option
Aiscent can work exclusively and meticulously with you in order to design an ALDI-SD that perfectly matches your needs. Depending on the required resolution, throughput rate, substrate size, and accessory needs, Aiscent can customize a machine to fit your requirements. Please contact sales for additional information and consultation.

Lower Left: Spherical Chip
Lower Right: Pattern on 1mm diameter sphere


ALDI-SD for Spherical Surface Lithography Solution (.pdf 88KB)